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Information card for entry 2300642
Preview
| Coordinates | 2300642.cif |
|---|---|
| Structure factors | 2300642.hkl |
| Original paper (by DOI) | HTML |
| Formula | O192 Si96 |
|---|---|
| Calculated formula | O192 Si96 |
| Title of publication | On the quality of the continuous rotation electron diffraction data for accurate atomic structure determination of inorganic compounds |
| Authors of publication | Wang, Yunchen; Yang, Taimin; Xu, Hongyi; Zou, Xiaodong; Wan, Wei |
| Journal of publication | Journal of Applied Crystallography |
| Year of publication | 2018 |
| Journal volume | 51 |
| Journal issue | 4 |
| a | 20.022 ± 0.004 Å |
| b | 19.899 ± 0.004 Å |
| c | 13.383 ± 0.003 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 5332 ± 1.9 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 2 |
| Space group number | 62 |
| Hermann-Mauguin space group symbol | P n m a |
| Hall space group symbol | -P 2ac 2n |
| Residual factor for all reflections | 0.2515 |
| Residual factor for significantly intense reflections | 0.2327 |
| Weighted residual factors for significantly intense reflections | 0.5421 |
| Weighted residual factors for all reflections included in the refinement | 0.5571 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.177 |
| Diffraction radiation wavelength | 0.0251 Å |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | Yes |
| Revision | Date | Message | Files |
|---|---|---|---|
| 208877 (current) | 2018-07-06 | cif/ hkl/ Adding structures of 2300634, 2300635, 2300636, 2300637, 2300638, 2300639, 2300640, 2300641, 2300642, 2300643 via cif-deposit CGI script. |
2300642.cif 2300642.hkl |
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Users of the data should acknowledge the original authors of the
structural data.